Simplifying Atomic Force Microscopy
Presented by: Alberto Gomez-Casado, Ph.D., Project Leader
WHERE AND WHEN
Thursday, February 27th, 2020
11:00am–1:00pm Technology Presentations
1:00pm-2:00pm Live Instrument Demos
12-0168, MIT.nano (basement level), Building 12
60 Vassar Street (rear)
Cambridge, MA
REGISTER
Anton Paar introduces the Tosca series of atomic force microscopes (AFM), a new generation of highly-automated AFMs designed from the ground up. Building upon innovations in the fields of surface nano-mechanical testing and rheology, significant efforts have been made to improve every aspect of AFM operation. Seminar attendees will experience a new generation of AFMs and see behind the curtain into the creation and thought process leading to a novel AFM platform.
Developed initially in 1985 by Binnig, Quate, and Gerber, the field of scanning probe microscopy experienced rapid growth throughout the 1990s. However, more recently, progress in AFM development has slowed and is mainly limited to incremental improvements in various testing modes. Anton Paar’s Tosca AFMs combine the latest developments in testing modes with similar advances in usability, automation, and speed, which decreases downtime, improves productivity, and results in faster implementation.
Improvements focus on the overall AFM user experience by closely examining every step in the process, from turning on the instrument to generating reports. Specifically, the probemaster, an automatic cantilever exchange tool, accommodates 95% of the tips on the market and enables tweezer-free tip exchange, eliminating the drawbacks of unsteady hands and the expense of broken tips. Automatic laser alignment focuses the Z-position laser off the end of the cantilever beam with the click of a mouse. A wide sample stage allows large and/or tall samples to be tested, including silicon wafers. Multiple built-in cameras enable sample viewing from the side, under the microscope, and even with a panoramic view of the entire sample stage. Results are obtained quickly with fast scanning capabilities and are then easily imported into the Tosca analysis software, with the ability to generate automatic sample reports.
A number of application examples and technical advances will be highlighted, including topographical analysis of micro-lens arrays, cellulose embedded PET films, corrosion inhibition of aluminum alloys, quantum dots embedded on gallium arsenide (GaAs) wafers, mechanical contrast of polymer blends, and magnetic and electrical properties of metal-composite films.
Finally, a novel line of instrumented scratch, indentation, and tribology capabilities will be introduced. This newly released platform, the Step X00, complements the AFM technology by enabling analysis of adhesion strength, modulus and hardness, visco-elastic properties, and friction and wear resistance, all on a single platform. Again, with a focus on ease of use, the Step platform directly interfaces with the Tosca AFM to precisely measure and image material surfaces, and utilize the Python programing language to perform automated testing, data analysis, and reporting.