MIT.nano workshop with Lesker
DATE: Tuesday, November 12 and Wednesday, November 13
TIME: 10 a.m. – 5 p.m. (both days)
LOCATION: MIT.nano (12-0168)
SPEAKER: J.R. Gaines, Technical Director of Education, Kurt J. Lesker Company
ABSTRACTS
Day 1, November 12: Introduction to Vacuum Science and System Design
This classroom workshop is designed to introduce attendees to basic concepts in vacuum technology and how they apply to system design and operation. Subjects covered will include molecular density in vacuum, the ideal gas law, molecular flow in vacuum pressure regimes, characteristics of gas composition at various molecular densities, general principles of gas-solid interactions, vacuum pump technology, pressure sensors, leak detection, and the impact of fundamental design decisions and operating practices on vacuum system performance. Several simple tests to verify vacuum system performance will be discussed. The critical importance of vacuum hygiene will be stressed and cleaning for vacuum service will be reviewed.
This workshop is intended for people who are new to vacuum or may not have any formal training. It also provides a general review for experienced vacuum technologists. The student should achieve a general understanding of vacuum technology as a foundation for further training in vacuum system design and thin film deposition.
Day 2, November 13: Physical Vapor Deposition and Thin Film Growth Models
This classroom workshop is designed to introduce the attendees to fundamental concepts and operating principles for the deposition of thin films by thermal and e-beam evaporation as well as direct current magnetron sputtering (dcMS), pulsed dcMS, radio frequency magnetron sputtering (RfMS), and high impulse power magnetron sputtering (HIPMs) techniques. It will include a recap of basic vacuum science, followed by fundamental design and operational aspects of each thin film deposition technique as they impact thin film properties, such as morphology and thickness uniformity. Correlation between process parameters, such as deposition rate, and film properties, including electrical resistivity and reflectivity, will be discussed. Several models for thin film growth will be presented with reference to how specific materials properties, including film/substrate interactions, and deposition conditions may affect thin film structures.
The student should achieve a general understanding of thin film deposition by physical vapor techniques, how those techniques influence film properties, and be familiarized with available resources for further training.
Speaker Bio
J.R. Gaines is the Technical Director of Education for the Kurt J. Lesker Company, (Jefferson Hills, PA). The Lesker Company is a global scientific equipment manufacturer supplying materials and tools for vacuum-enabled innovation. Gaines has more than 40 years of experience in the research, development, and commercialization of advanced materials technologies including superconductivity, semiconductors, cryogenics, space simulation, energy generation, energy conversion and storage. His experience includes vacuum systems, thin film deposition, inorganic chemistry, nanotechnology, and advanced ceramic processing. He currently develops and delivers the company’s many educational programs through Lesker University teaching events.
Prior to joining the Lesker Company, J.R. worked for Lake Shore Cryotronics manufacturing temperature sensors; Superconductive Components, Inc. where he developed a line of ceramic superconductors and superconductive devices; Oak Ridge Micro-Energy where he helped commercialize solid-state thin film batteries; and the Sputtering Target Manufacturing Company where he developed a unique approach for advanced ceramic sputtering targets, which was subsequently acquired by the Kurt J. Lesker Company.