Please join us to learn from TESCAN experts on the advancement in analytical and plasma Focused Ion Beam technologies
11:00am-1:00pm
12-0168, MIT.nano (basement level)
60 Vassar Street (rear)
Cambridge, MA
Beyond Gallium: An in-depth look at advances in plasma FIB with focus on TOF-SIMS and lithium battery research
Plasma FIB has quickly established itself as the go-to method for precise removal of large volumes of material. Plasma FIB also has proven highly valuable in nanoanalysis due to a lack of gallium implantation. In this presentation, Tescan experts will compare gallium and plasma FIB performance and highlight some unique techniques enabled by plasma FIB, including state of the art lithium-ion battery research with plasma FIB and ToF-SIMS.
NanoSpace: An Analytical FIB-SEM: Ultimate Performance under Ultra-High Vacuum environment
NanoSpace is the unique analytical FIB-SEM (Scanning Electron Microscope and Focused Ion beam) complete instrument working in an ultra-clean environment (below 5.10-10 mbar inside the chamber) that offers customized and complete solution for FIB nano-machining and surface analysis on samples requiring the most rigorous contaminant-free environment. Modular architecture developed by TESCAN ORSAY HOLDING allows a large choice of SEM and FIB columns compatible with third party UHV compatible systems (e.g. Molecular Beam Epitaxy system, Synchrotron facilities) and matching specifics of end-users needs and goals. In this talk, the different configurations of NanoSpace will be highlighted via applications in FIB milling, epitaxial growth, Auger and SIMS.